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Home
Tool Set
Thermal & Implant
Jira links
AG 610A RTP
Created by
Thomas Grimsley
, last modified on
May 26, 2022
Facts
The AG 610 RTP - is for rapid thermal annealing (RTP) of MOS grade wafers
Typical use is annealing out damage caused by ion implant to the silicon crystal structure.
Personnel
Tool Engineer -
Rich Battaglia
Process Engineer -
Sean O'Brien
Manuals & Users
AG610 RTP Manual
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