RIT will permanently shut down the RIT Wiki (Confluence wiki) on February 2, 2024. Review the Wiki Shut Down Overview for information on alternative tools, exporting content from the wiki, and other FAQs.
Facts
The AME P5000 is a multi-chamber tool set up for a variety of processes
- Chamber C - RIE of Silicon Dioxide
- CHF3, CF4, and O2 are used to reactively ion etch silicon dioxide.
- Other Chambers
Personnel
- Tool Engineer - John Nash
- Process Engineer - Sean O'Brien
- Super User - Patricia Meller
- Any of these personnel can certify new users
Manuals & Users
Overview
Content Tools
Please go to our SMFL Main Website
for information about