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Facts

  • The ASM LPCVD is a two tube systems capable of depositing polysilicon, silicon nitride and LTO.
    • It is configured for both 4 inch and 6 inch wafers.
    • It uses dedicated quartz boats.
  • Tube 1 - LPCVD of low temperature oxide
    • Silane and oxygen are brought into a heated furnace tube at low pressures to react and grow a silicon dioxide film

Personnel

  • Tool Engineer - Bruce Tolleson
  • Process Engineer - Sean O'Brien

Tool & Process Information

Manuals & Users

 

 

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