• The ASM LPCVD is a two tube systems capable of depositing polysilicon, silicon nitride and LTO.
    • It is configured for both 4 inch and 6 inch wafers.
    • It uses dedicated quartz boats.
  • Tube 1 - LPCVD of low temperature oxide
    • Silane and oxygen are brought into a heated furnace tube at low pressures to react and grow a silicon dioxide film


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