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- The ASM LPCVD is a two tube systems capable of depositing polysilicon, silicon nitride and LTO.
- It is configured for both 4 inch and 6 inch wafers.
- It uses dedicated quartz boats.
- Tube 1 - LPCVD of low temperature oxide
- Silane and oxygen are brought into a heated furnace tube at low pressures to react and grow a silicon dioxide film
- Tool Engineer - Bruce Tolleson
- Process Engineer - Sean O'Brien
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