ASM LPCVD Tube 1

Facts

• The ASM LPCVD is a two tube systems capable of depositing polysilicon, silicon nitride and LTO.
  • It is configured for both 4 inch and 6 inch wafers.
  • It uses dedicated quartz boats.

• Tube 1 - LPCVD of low temperature oxide
  • Silane and oxygen are brought into a heated furnace tube at low pressures to react and grow a silicon dioxide film

• Other Tubes
  • ASM LPCVD Tube 2 - LPCVD of Silicon Nitride / Polysilicon

Personnel

• Tool Engineer - Bruce Tolleson
• Process Engineer - Sean O'Brien
• Any of these personnel can certify new users

Tool & Process Information

• 425C LTO Recipe

Manuals & Users

• ASM LPCVD Manual - Rev M - 1/28/20

• ASM LPCVD Certification Checklist