ASM LPCVD Tube 2

Facts

• The ASM LPCVD is a two tube systems capable of depositing polysilicon, silicon nitride and LTO.
  • It is configured for both 4 inch and 6 inch wafers.
  • It uses dedicated quartz boats.

• Tube 2 - LPCVD of Silicon Nitride / Polysilicon
  • Dichlorosilane and Ammonia are brought into a heated furnace tube at low pressures to react and grow a silicon nitride film
  • Silane is brought into a heated furnace tube at low pressures to react and grow a poly silicon

• Other Tubes
  • ASM LPCVD Tube 1 - LPCVD of low temperature oxide

Personnel

• Tool Engineer - Bruce Tolleson
• Process Engineer - Sean O'Brien
• Any of these personnel can certify new users

Tool & Process Information

• 610C Poly Recipe
• 650C Poly Recipe
• 800C Sto Nitride Recipe
• 810C Factory Nitride Recipe

Manuals & Users

• ASM LPCVD Manual - Rev M - 1/28/20

• ASM LPCVD Certification Checklist