• The ASML stepper is a 5x stepper with environmental control.
    • Uses 6" x 6" Quartz masks
    • Features on the photomask are reduced 5x down to the printed feature size.
    • Capable of features down to 0.35um in size
    • Field size is 22x22mm
    • Variable Numerical aperture 0.48-0.60
    • Conventional or annular illumination
    • Overlay from layer to layer is better than 50nm
  • It is configured for 150mm wafers and uses the mercury i-line 365nm for exposure.


Tool & Process Information

Manuals & Users

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