RIT will permanently shut down the RIT Wiki (Confluence wiki) on February 2, 2024. Review the Wiki Shut Down Overview for information on alternative tools, exporting content from the wiki, and other FAQs.
Facts
Tube 7 is used for the annealing & wet oxide growth of silicon substrates.
- Wafers are loaded into quartz boats - current size is 100mm.
- Currently reserved for Dr. Hirschman's Research
- Tube is considered contaminated - not qualified for MOS grade process.
Other Tubes
- Bruce Tube 1 - Wet Oxide Growth
- Bruce Tube 2 - P type diffusion
- Bruce Tube 3 - N type diffusion
- Bruce Tube 4 - Dry Oxide Growth
- Bruce Tube 5 - External Torch Low Temp Oxide Growth
- Bruce Tube 6 - Wet Oxide Growth
- Bruce Tube 7 - Anneal
- Bruce Tube 8 - High Temp Anneal
Personnel
- Tool Engineer -
- Process Engineer - Sean O'Brien
- Process Engineer - Patricia Meller
Tool & Process Information
- Bruce Furnace Recipe Request Sheet
- If a new recipe is needed for the Bruce Furnace, fill out this sheet and return to Sean O'Brien
Manuals & Users
Overview
Content Tools
Please go to our SMFL Main Website
for information about