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Facts

  • The CHA an electron beam Evaporation Tool.
    • Target material is loaded in crucible liners.
    • The system is capable of holding eight crucibles for multi-source deposition.
    • Dielectrics and metals can be deposited.
      • Materials with significant vapor pressures at lower temperatures (Sb, Cd, Zn, etc) are not allowed.

*The system has platens for 100mm and 150mm wafers

Personnel

Tool & Process Information

Manuals & Users

CHA Evaporator Manual
CHA Evaporator Certification Checklist

 

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