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AME P5000 Chamber A

  • Used for PECVD Deposition of TEOS Oxide

AME P5000 Chamber B

  • Used for PECVD Deposition of Silicon Nitride & Amorphous silicon

ASM LPCVD Tube 1

  • Used for LPCVD deposition of low temperature oxide

ASM LPCVD Tube 2

  • Used for LPCVD deposition of polysilicon and silicon nitride

SMFL Parylene

  • Used for thermal deposition of parylene

Drytek Quad Chamber 4

  • Used for PECVD depostion of carbon films

Other Information

SMFL CVD Process Information

Good overview of CVD Processes

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