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AME P5000 Chamber A

  • Used for PECVD Deposition of TEOS Oxide

AME P5000 Chamber B

  • Used for PECVD Deposition of TEOS Oxide on contamination threat substrates

ASM LPCVD Tube 1

  • Used for LPCVD deposition of low temperature oxide

ASM LPCVD Tube 2

  • Used for LPCVD deposition of polysilicon and silicon nitride

Ultratech S200 ALD

  • Deposition of atomic layer films

Other Information

SMFL CVD Process Information

Good overview of CVD Processes

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