Dry Etch

Plasma / Reactive Ion Etch

LAM 490 AutoEtch

• Used for plasma etching of silicon and silicon nitride

Trion Minilock Etcher

• Used for reactive ion etching of silicon oxide

Trion Phantom III Etcher

• Used for reactive ion etching of silicon nitride and poly-silicon

Trion ICP Etcher

• Used for etching of dielectrics over III-V materials

AME P5000 Chamber C

• Used for reactive ion etching of silicon dioxide

Plasmatherm ICP Cl Etcher

• Used for ICP chlorine etching of III-V mterials
  
  

Oxygen Plasma Strippers

Trion Apollo Asher

• Used for oxygen plasma ashing of photoresists

Other Etchers

Xactic XeF2 Etcher

• Used for surface release etching silicon

STS ASE Deep Si Etcher

• Used for deep anisotropic etches of SI

Other Information

Dry Etch Process Information