Plasma / Reactive Ion Etch
- Used for reactive ion etching of various films and deposition of carbon films/tubes
- Used for dry etching of aluminum metal layers
- Used for plasma etching of silicon and silicon nitride
- Used for reactive ion etching of silicon oxide
- Used for reactive ion etching of silicon dioxide
Oxygen Plasma Strippers
- Used for downstream oxygen plasma stripping of photoresist on silicon
- Used for downstream oxygen plasma stripping of photoresist on contamination threat wafers
Other Etchers
- Used for surface release etching silicon
- Used for deep anisotropic etches of SI
Other Information
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