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Exposure Tool

ASML PAS 5500/200 i-line 5x Stepper

  • 0.35um capable - 150mm wafers

GCA g-line 5x Stepper

  • ~1.0um capable - 100mm wafers

Karl Suss MA150 1x Contact Aligner

  • ~2um capable - 150 mm wafers - i-line filtering for better resolution

Karl Suss MA56 1x Contact Aligner

  • ~2um capable - multiple size substrates

Coat / Develop Tools

SVG 88 Coat/Develop Track

  • Set up for 100mm wafers - gline resist dispense

SSI Coat/Develop Track

  • Set up for 150mm wafers - iline resist dispense

Manual Coat / Develop Tools

CEE Manual Spin Coater

  • Use for manual coating of positive photoresists

SCS Manual Spin Coater

  • Use for manual coating of photoresists, SU8, Polyimides, & Spin on Glass

CEE Manual Developer

  • Use for manual spray development of positive photoresists

 

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