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The photoresist solvent strip process uses Baker PRS-2000.  Wafers are usually soaked in each bath at 90°C for 5 minutes, rinsed for 5 minutes and then put in the rinser/dryer.

The PRS-2000 is intended for conventional positive resist only.  Other materials such as negative resist, barcs and lift off resists may not dissolve completely and clog the bath drains.

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