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Home
Tool Set
Dry Etch
Jira links
STS ASE Deep Silicon Etch
Created by
Sean O'Brien
, last modified by
Thomas Grimsley
on
May 26, 2022
Facts
The STS ASE Deep Silicon Etch is a loadlocked system.
The process gases are C
4
F
8
, SF
6
, O
2
and Ar.
No metals allowed.
Personnel
Tool Engineer -
Rich Battaglia
and
Bruce Tolleson
Process Engineer -
Sean O'Brien
Super User -
Patricia Meller
Any of these personnel can certify new users
Tool & Process Information
STS Process Information
Manuals & Users
STS Manual - Rev B - 3/11/20
STS Certification Checklist
No labels
Overview
Content Tools
{"serverDuration": 316, "requestCorrelationId": "da00e33d15de69bb"}