• The Trion ICP etcher is a inductively coupled plasma etcher set up for 100 or 150mm wafers.
  • The Trion is a loadlocked system and is used for the reactive ion etching of silicon nitride and polysilicon.
  • The system is currently plumbed with .
  • No metals & metal etching is allowed in this tool


Tool & Process Information

Manuals & Users

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