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Facts
The Trion PECVD is an ICP chemical vapor deposition systems
- It is plumbed with SiH4, NH3, CF4, O2, N2
- It is used for the deposition of Silicon Nitride and Silicon Dioxide on III-V substrates
Personnel
- Equipment Engineer - Rich Battaglia
- Process Engineer - Sean O'Brien
- Super User - Venkatesh Deenadaylan
- Any of these personnel can certify new users
Tool & Process Information
Manuals & Users
Overview
Content Tools
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