• The Trion Phantom III etcher is a reactive ion etcher set up for 100 or 150mm wafers.
  • The Trion is a loadlocked system and is used for the reactive ion etching of silicon nitride and polysilicon and metals like molybdenum with fluorine etching. 
  • The Trion is plumbed with SF6, CF4, CHF3 and O2. 


Tool & Process Information

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