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The Ultratech S200 G2 Savannah ALD system is a single chamber atomic layer deposition system. 

  • It has four precursor channels number 0-3 and has Deionized H2O, HfO2, TMA, and TDMAT or DEZ. 
  • Precursors can change with the needs of users but must be scheduled with the SMFL to make any changes.


Tool & Process Information

Manuals & User

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