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  • Wet Bench - Nitride and Silicon Etch
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This wet bench is set up for a variety of chemical processes.

  • There is a heated quartz bath with a condensation coil for hot phosphoric acid etching of silicon nitride.
  • There is a heated quartz bath with potassium hydroxide (KOH) for crystallographic etching of silicon.
  • In addition, there are several tanks with BOE and Freckle Etch for silicon dioxide etching.


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