This wet bench is set up for a variety of chemical processes.
- There is a heated quartz bath with a condensation coil for hot phosphoric acid etching of silicon nitride.
- There is a heated quartz bath with potassium hydroxide (KOH) for crystallographic etching of silicon.
- In addition, there are several tanks with BOE and Freckle Etch for silicon dioxide etching.
Manuals & Users