This wet bench is configured to perform the RCA Cleaning Process.
- Silicon wafers that have seen previous processing are allowed
- Bench is configured with a heated quartz tank for SC1 Clean or APM (Ammonia/peroxide mix) and a heated quartz tank for a SC2 Clean or HPM (Hydrochloric / Hydrogen Peroxide mix).
- A 50:1 HF tank is in the bench for native oxide removal.
- Rinse tanks for each process step are also in the bench.
- The wetbench also has a heated quartz bath for Piranha Cleans. This is currently reserved for the Hirschman research group.
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