This wet bench is configured to perform the RCA Cleaning Process

  • Used for MOS grade wafers prior to gate oxidation.
    • No gold, copper, other trap inducing materials.
  • Bench is configured with a heated quartz tank for SC1 Clean or APM (Ammonia/peroxide mix) and a heated quartz tank for a SC2 Clean or HPM (Hydrochloric / Hydrogen Peroxide mix).
  • A 50:1 HF tank is in the bench for native oxide removal.
  • Rinse tanks for each process step are also in the bench.
  • The wetbench also has a heated quartz bath for Piranha Cleans .


Tool & Process Information

Manuals & Users

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