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Facts

The Xactic Etcher is an non-plasma dry etch tool.

  • It employs XeF2 to bulk etch exposed silicon surfaces.
  • It is intended as a release etch for silicon in MEMs applications
  • It is not intended as a deep silicon etcher or a through-hole etcher, and is completely isotropic

Personnel

Tool & Process Information

Manuals & Users

 

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