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Tool

Certification

Use

ASM LPCVD Tube 1

Required

LPCVD Low Temperature Oxide

ASM LPCVD Tube 2

Required

LPCVD Nitride, Polysilicon

AME P5000 Chamber A

Required

4" and 6" TEOS at 390C

AME P5000 Chamber B

Required

4" and 6" PECVD Nitride at 400C

SMFL Parylene

Required

Parylene deposition system

Drytek Chamber 4

Required

Diamond Like Carbon Deposition

Ultratech S200 ALDRequiredDeposition of atomic layer films

Metrology

Tool

Certification

Use

Leitz Inspection Station

None

Optical linewidth measurement

Leica Inspection Station

None

Optical microscope with image capture

Olympus Microscope Station

None

Optical microscope with Nomarski

Nanometrics Spectrophotometer

None

Measurement of oxide, nitride

Prometrix SpectraMap

Required

Measurement of oxide, nitride

Rudolph AutoEL IV Ellipsometer

Required

Ellipsometry of thin films

Woollam VASE

Required

Ellipsometry using variable angle, multi spectral

Wyko Dynamic Optical Profiler

Required

Dynamic measurement of step heights using interferometry

CDE Res Map

Required

Measurement of film resistivity

Tencor P2

Required

Profilometer measurement of film steps

Amray 1830 SEM

Required

Scanning electron microscope

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