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Tool

Certification

Use

GCA Stepper

Required

5x Stepper for exposure of 100mm substrates - g-line

ASML PAS 5500/200 Stepper

Required

5x Stepper for exposure of 150mm substrates - i-line

Heidelberg DWL 66+RequiredExposure system for direct write or maskmaking

Suss MA150 Mask Aligner

Required

1x Contact Aligner for exposure of 150mm substrates - broadband/i-line

Suss MA56 Mask Aligner

Required

1x Contact Aligner for exposure of multiple size substrates - broadband

SVG 88 Wafertrack

Required

Coat/Develop track for 100mm substrates

SSI 150 Wafertrac

Required

Coat/Develop track for 150mm substrates

CEE Resist Coater

Required

Manual Coat for photoresist only - 100/150mm

CEE Resist Developer

Required

Manual Develop for photoresist - 100/150mm

SCS 6700 Spincoater

Required

Manual Coat for SU8 / Polyimides / SOG -multiple sizes

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