This wet bench is configured to perform the RCA Cleaning Process
- Used for MOS grade wafers prior to gate oxidation.
- Bench is configured with a heated quartz tank for SC1 Clean or APM (Ammonia/peroxide mix) and a heated quartz tank for a SC2 Clean or HPM (Hydrochloric / Hydrogen Peroxide mix).
- A 50:1 HF tank is in the bench for native oxide removal.
- Rinse tanks for each process step are also in the bench.
- The wetbench also has a heated quartz bath for Piranha Cleans .
- Tool Engineer - Peter Morici
- Process Engineer - Sean O'Brien
- Process Engineer - Patricia Meller