Facts
This bench is set up with two different processes - hot phosphoric acid for aluminum etching and an NMP based stripper for photoresist removal.
- Solvent Strip Tanks use Baker PRS-2000 Resist Stripper
- Aluminum Etch Tank uses Fuji 16:1:1:2 Aluminum Etch
Personnel
- Tool Engineer - Peter Morici
- Process Engineer - Sean O'Brien
- Process Engineer - Patricia Meller
Tool & Process Information
Manuals & Users
Overview
Content Tools