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Rapid Thermal Anneal

AG 610A RTP

  • Annealing of clean MOS grade silicon wafers

Furnaces

Bruce Tube 1

  • Used for wet oxidation of silicon substrates

Bruce Tube 2

  • Used for diffusion of p-type dopants

Bruce Tube 3

  • Used for diffusion of n-type dopants

Bruce Tube 4

  • Used for dry oxidation of silicon substrates

Bruce Tube 5

  • Fitted with external torch for low temp wet oxide growth

Bruce Tube 6

  • Used for wet oxidation of silicon substrates

Bruce Tube 7

  • Used for anneals & wet oxide growth

Bruce Tube 8

  • Used for high temperature anneals

Implant

Varian 350D Implanter

  • Used for implantation of boron and phosphorous

Ovens

Heraeus Vacuum Oven

  • Used for heat treatment of substrates under vacuum

Blue M Ovens

  • Used for heat treatment of substrates.

Other Information

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