- The CHA an electron beam Evaporation Tool.
- Target material is loaded in crucible liners.
- The system is capable of holding eight crucibles for multi-source deposition.
- Dielectrics and metals can be deposited.
- Materials with significant vapor pressures at lower temperatures (Sb, Cd, Zn, etc) are not allowed.
*The system has platens for 100mm and 150mm wafers
Manuals & Users
CHA Evaporator Manual
CHA Evaporator Certification Checklist