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[Image:al_solvent_Bench.jpg]
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==Facts==
This bench is set up with two different processes - hot phosphoric acid for aluminum etching and an NMP based stripper for photoresist removal.

*Solvent Strip Tanks use [SMFL Chemistry#PRS 2000 ] Resist Stripper
*Aluminum Etch Tank uses Fuji 16:1:1:2 [SMFL Chemistry#Aluminum Etch ]

==Personnel==

*Tool Engineer - http://www.smfl.rit.edu/staff.php Dave Yackoff
*Process Engineer - http://www.smfl.rit.edu/staff.php Sean O'Brien

==Tool & Process Information==

*http://www.smfl.rit.edu/tool_status.php Al Etch/Solvent Strip Status
*[Wet_Chemical_Processing ]

==Manuals & Users==
http://www.smfl.rit.edu/pdf/manual/Manual_Wetbench_Aluminum_Etch_and_Solvent_Strip.pdf Aluminum Etch & Solvent Strip Bench Manual

http://www.smfl.rit.edu/pdf/checklist/Certification_Checklist_Wetbench_-_Al_Etch_And_Solvent_Strip.pdf Aluminum Etch & Solvent Strip Wetbench Certification Checklist

http://www.smfl.rit.edu/certified_users.php?tool=Wet_Bench_-_Al_Etch_and_Solvent_Strip Certified Users for the Aluminum Etch & Solvent Strip Wetbench

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