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This bench is set up with two different processes - hot phosphoric acid for aluminum etching and an NMP based stripper for photoresist removal.

*Solvent Strip Tanks use [SMFL Chemistry#PRS 2000 ] Resist Stripper
*Aluminum Etch Tank uses Fuji 16:1:1:2 [SMFL Chemistry#Aluminum Etch ]


*Tool Engineer - Dave Yackoff
*Process Engineer - Sean O'Brien

==Tool & Process Information==

* Al Etch/Solvent Strip Status
*[Wet_Chemical_Processing ]

==Manuals & Users== Aluminum Etch & Solvent Strip Bench Manual Aluminum Etch & Solvent Strip Wetbench Certification Checklist Certified Users for the Aluminum Etch & Solvent Strip Wetbench

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