SMFL Services and Capabilities

The capabilities of the SMFL include:

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:The SMFL offers a wide range of services from single process up to foundry services.
:It is by no means a complete list, please contact us so that we can discuss your needs.

Foundry Services

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The SMFL has a 2um CMOS process with an effective L of 1.5um.

If you require this information or a quote on your process, please contact T. Grimsley

Single Process Services

Metrology

Scanning Electron Microscopy

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There are several SEMs available for imaging a variety of samples.
:Amray 1830 LaB6 system
:LEO EVO 50 LaB6 system. Contact Sean Rommel of RIT's Electrical and Microelectronic engineering Department about this tool.

Film Thickness - Ellipsometry
:Woollam VASE with Autoretarder operating at wavelengths from 240-1700nm and variable angle of incidence.
:Rudolph Auto EL IV operating at three wavelengths

Film Thickness - Profilometry
:Tencor P2 is a long length scanning profilometer useful for measuring step heights.

Film Thickness - Optical
:Prometrix SpectraMap SM300 and two Nanometrics Spectrophotometers that provide noncontact optical film thickness measurement mapping - Resist, oxide, nitride.

Resistivity Measurements'
:CDE Res Map provides sheet resistance and resistivity mapping of silicon wafers and films.

Thin Film Deposition

Sputter Deposition
: The SMDL has a variety of DC and RF deposition tools. The [PE4400_Sputter ] is loadlocked and has sputter etch capability.
: A wide variety of targets exist in bonded 8" form and unbonded 4" targets for the sputter head on the [CVC_601_Sputter ].
::Al/Si, Ti, Cr, W/Ti, Cu, Mo, Ta - 8" bonded, water cooled targets
::Cu, Ti, Ni, Cr, Ge, InSn, Mo, NiCr - 4" target for sputter head

Thermal Evaporation
:The SMFL has [Physical_Vapor_Deposition ] - one is a basket style for various metals and the other is a flash evaporator for deposition of aluminum.

Electron Beam Evaporation
The SMFL has a [CHA_Ebeam_Evaporator ] with a 3KV electron beam gun with an eight pocket carousel.

Plasma Enhanced Chemical Vapor Deposition (PECVD)
The SMFL has a Applied Materials P5000 systems equipped with two deposition chambers
:[AME_P5000_Chamber_A ] from a few nanometers to many microns can be deposited
:[AME_P5000_Chamber_B ] can also be deposited.

Low Pressure Chemical Vapor (LPCVD)
:Our [ASM_LPCVD_Tube_1 ] system is capable of depositing Nitride, Poly and Low Temp Oxide.
:We also has an [SMFL_Parylene ] deposition system

A complete listing of all of the Tools in the SMFL can be found here