The capabilities of the SMFL include:
:The SMFL offers a wide range of services from single process up to foundry services.
:It is by no means a complete list, please contact us so that we can discuss your needs.
The SMFL has a 2um CMOS process with an effective L of 1.5um.
If you require this information or a quote on your process, please contact T. Grimsley
Scanning Electron Microscopy
There are several SEMs available for imaging a variety of samples.
:Amray 1830 LaB6 system
:LEO EVO 50 LaB6 system. Contact Sean Rommel of RIT's Electrical and Microelectronic engineering Department about this tool.
Film Thickness - Ellipsometry
:Woollam VASE with Autoretarder operating at wavelengths from 240-1700nm and variable angle of incidence.
:Rudolph Auto EL IV operating at three wavelengths
Film Thickness - Profilometry
:Tencor P2 is a long length scanning profilometer useful for measuring step heights.
Film Thickness - Optical
:Prometrix SpectraMap SM300 and two Nanometrics Spectrophotometers that provide noncontact optical film thickness measurement mapping - Resist, oxide, nitride.
:CDE Res Map provides sheet resistance and resistivity mapping of silicon wafers and films.
: The SMDL has a variety of DC and RF deposition tools. The [PE4400_Sputter ] is loadlocked and has sputter etch capability.
: A wide variety of targets exist in bonded 8" form and unbonded 4" targets for the sputter head on the [CVC_601_Sputter ].
::Al/Si, Ti, Cr, W/Ti, Cu, Mo, Ta - 8" bonded, water cooled targets
::Cu, Ti, Ni, Cr, Ge, InSn, Mo, NiCr - 4" target for sputter head
:The SMFL has [Physical_Vapor_Deposition ] - one is a basket style for various metals and the other is a flash evaporator for deposition of aluminum.
Electron Beam Evaporation
The SMFL has a [CHA_Ebeam_Evaporator ] with a 3KV electron beam gun with an eight pocket carousel.
Plasma Enhanced Chemical Vapor Deposition (PECVD)
The SMFL has a Applied Materials P5000 systems equipped with two deposition chambers
:[AME_P5000_Chamber_A ] from a few nanometers to many microns can be deposited
:[AME_P5000_Chamber_B ] can also be deposited.
Low Pressure Chemical Vapor (LPCVD)
:Our [ASM_LPCVD_Tube_1 ] system is capable of depositing Nitride, Poly and Low Temp Oxide.
:We also has an [SMFL_Parylene ] deposition system
A complete listing of all of the Tools in the SMFL can be found here