This is a listing of SMFL Approved Chemistry for the various research projects.
If your chemical is not on the list, under your group - it has not been cleared for use and may not be released or brought into the lab.
You can find the SMFL Imported Chemical Form here
Researcher | Chemical | Manufacturer | Rev | SDS Link |
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ASI Semiconductor | Nichrome etchant | Transene | 5/1/19 | SDS |
Carter | Dextran | MP Biomedicals | 1/29/15 | SDS |
Carter | SU8 3010 Photoresist | Microchem | 10/15/14 | SDS |
Carter | Sylgard 184 Silcone | Dow Corning | 2/17/15 | SDS |
Carter | Sylgard 184 Silcone Curing Agent | Dow Corning | 3/19/16 | SDS |
Ewbank | 8250 Photoresist | Arch/Fuji | 1/12/00 | |
Ewbank | APX K1 | Brewer | 1/21/15 | |
Ewbank | ARC iCon 16 | Brewer | 7/26/18 | |
Ewbank | ARC iCon 7 | Brewer | 7/26/18 | |
Ewbank | AZ 9260 Photoresist | AZ | 4/5/15 | |
Ewbank | Butyl Acrylate | Sigma Aldrich | 3/13/15 | |
Ewbank | Darocur/Igracure 1173 Photoinitiator | Ciba/BASF | 7/8/14 | |
Ewbank | Ethylene Glycol | Sigma Aldrich | 2/26/15 | |
Ewbank | Gamma-Hydroxybutyric acid lactone | Sigma Aldrich | 6/24/14 | |
Ewbank | IRGAcure 651 | Ciba/BASF | 4/30/15 | |
Ewbank | IM HM140 Spin on Carbon | Irresistable Materials | 2/24/15 | SDS |
Ewbank | Isobornyl acrylate | Sigma Aldrich | 11/27/14 | |
Ewbank | Propylene glycol monomethyl ether acetate | Sigma Aldrich | 12/11/14 | SDS |
Ewbank | ProTEK B3 25 | Brewer | 7/13/15 | SDS |
Ewbank | ProTEK B3 25 Primer | Brewer | 4/21/15 | SDS |
Ewbank | TSMR-iN008 PM Photoresist | TOK | 1/1/06 | |
Ewbank | WS 3543 | Indium | 10/3/14 | |
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Fuller | Carbon Standard Organic | Ricca | 5/1/15 | |
Fuller | PI-2556 Polyimide | HD Micro | 5/7/15 | |
Gaborski | SU8 Developer | Microchem | 10/28/11 | SDS |
Gaborski | SU8 3010 Photoresist | Microchem | 10/15/14 | SDS |
Gaborski | BARLI-II 90 | AZ | 4/5/15 | SDS |
Gaborski | AQUATAR COATING | AZ | 7/8/15 | SDS |
Hirschman | 512B - Spin on Glass | Honeywell | 8/25/15 | SDS |
Hirschman | Accuglass P112 SOG | Honeywell | 11/19/14 | |
Hirschman | Adhesion Promoter AP3000 | Dow | 5/4/15 | SDS |
Hirschman | B150X - Boron Spin on Dopant | Honeywell | 1/5/15 | SDS |
Hirschman | B75X - Boron Spin on Dopant | Honeywell | 1/5/15 | SDS |
Hirschman | BDC1 - Boron Dopant Coating | Futurrex | 1/31/18 | SDS |
Hirschman | Cyclotene 3022 | Dow Chemical | 5/4/15 | SDS |
Hirschman | Developer RD6 | Futurrex | 1/21/19 | |
Hirschman | INTERVIA PHOTODIELECTRIC 8023-10 | Rohm & Haas | 8/29/19 | SDS |
Hirschman | mr-DWL 40 Photoresist | Microresist Technology | 2/12/16 | SDS |
Hirschman | NR9g-1500PY Photoresist | Futurrex | 1/13/16 | SDS |
Hirschman | PDC5 - Phosphorous Dopant Coating | Futurrex | 1/31/18 | SDS |
Hirschman | P5S - Spin on Glass | Honeywell | 10/24/14 | SDS |
Hirschman | Remover RR5 | Futurrex | 1/29/14 | |
Hirschman | SUEX TDFS Dry Resist | DJ Devcorp | 9/30/15 | SDS |
Hubbard | Ammonium Sulfide | Alfa Aesar | 10/9/12 | SDS |
Hubbard | AZ 300 MIF Developer | Clariant | 9/19/12 | SDS |
Hubbard | AZ 5214 Photoresist | Clariant | 4/17/15 | SDS |
Hubbard | KMPR 1005 Photoresist | Microchem | 4/19/12 | |
Hubbard | KMPR 1010 Photoresist | Microchem | 4/19/12 | |
Hubbard | LOR 10A | Microchem | 10/7/14 | SDS |
Hubbard | Microposit S1813 Photoresist | Dow / Rohm& Haas | 7/22/15 | SDS |
Hubbard | Potassium Sodium Tartrate Tetrahydrate | Sigma Aldrich | 1/20/15 | SDS |
Hubbard | Sylgard 184 Silcone | Dow Corning | 2/17/15 | SDS |
Hubbard | Sylgard 184 Silcone Curing Agent | Dow Corning | 3/19/16 | SDS |
Hubbard | Arsine | Matheson | 12/4/14 | SDS |
Hubbard | Disilane | Matheson | 3/14/14 | SDS |
Hubbard | Forming Gas (5% H2 in N2) | Matheson | 10/26/15 | SDS |
Hubbard | Hydrogen | Matheson | 3/14/14 | SDS |
Hubbard | Phosphine | Matheson | 12/10/12 | SDS |
Hubbard | Trimethylgallium (TMGa) | Dow/SAFC Hitec | 4/20/15 | SDS |
Hubbard | Triethylgallium (TEGa) | Dow/SAFC Hitec | 8/1/14 | SDS |
Hubbard | Trimethylindium (TMIn) | Dow/SAFC Hitec | 12/11/15 | SDS |
Hubbard | Trimethylaluminum (TMAl) | Dow/SAFC Hitec | 3/16/15 | SDS |
Hubbard | Tritertiarybutylaluminum (TTBAl) | Dow/SAFC Hitec | 5/26/16 | SDS |
Hubbard | Triethylantimony | Dockweiler Chemicals | 1/20/16 | SDS |
Hubbard | Trimethylantimony | Dow/SAFC Hitec | 4/21/14 | SDS |
Hubbard | Tertiarybutylarsine | Dockweiler Chemicals | 6/5/15 | SDS |
Hubbard | Carbontetrachloride | Dow/SAFC Hitec | 4/9/15 | SDS |
Hubbard | Diethyltelluride | Dow/SAFC Hitec | 8/14/14 | SDS |
Koppula | SU8-3025 Photoresist | MicroChem | 10/15/14 | SDS |
Kurinec | Accuglass T-11 SOG | Honeywell | 4/23/14 | |
Kurinec | AZ 1518 Photoresist | AZ | 10/16/13 | |
Kurinec | Toluene | Sigma Aldrich | 2/25/14 | |
Landi | 495 PMMA Resist | Microchem | 10/10/14 | |
Landi | Microposit S1813 Photoresist | Dow / Rohm&Haas | 7/22/15 | SDS |
Lapizco-Encinas | SU8 2-25 Photoresist | MicroChem | 10/15/14 | SDS |
Lapizco-Encinas | SU8 3050 Photoresist | MicroChem | 10/15/14 | SDS |
Lapizco-Encinas | SU8 Developer | MicroChem | 10/28/11 | SDS |
Lapizco-Encinas | Sylgard 184 Silcone | Dow Corning | 2/17/15 | SDS |
Lapizco-Encinas | Sylgard 184 Silcone Curing Agent | Dow Corning | 3/19/16 | SDS |
Lu | Teflon AF | DuPont | 5/27/15 | |
Lu | Ethanol | Sigma Aldrich | 7/9/15 | |
Lu | SU8 2050 Photoresist | MicroChem | 10/15/14 | SDS |
MicroE | APX-K1 Adhesion Promoter | Brewer | 1/21/15 | |
MicroE | Borofilm B100 Spin on Dopant | Emulsitone | 5/1/15 | SDS |
MicroE | B150 Boron Spin on Dopant | Filmtronics | 10/1/15 | SDS |
MicroE | P509 Phosphorous Spin on Dopant | Filmtronics | 10/1/15 | |
MicroE | P8545SF Phosphorous Spin on Dopant | Filmtronics | 3/26/18 | SDS |
MicroE | Phosphorofilm | Emulsitone | 5/1/15 | SDS |
MicroE | mr-DWL 5 Photoresist | Microresist Technology | 2/12/16 | SDS |
MicroE | ma-N 1400 Negative Tone Photoresist | Microresist Technology | 6/11/15 | SDS |
MicroE | ma-N 2400 Negative Tone Photoresist | Microresist Technology | 6/11/15 | SDS |
MicroE | PMGI SF 13 | MicroChem | 3/26/15 | |
MicroE | ProTEK B3 21 | Brewer | 7/13/15 | SDS |
MicroE | ProTEK B3 25 | Brewer | 7/13/15 | |
MicroE | ProTEK B3 Primer | Brewer | 4/21/15 | |
Mosheni | ELASTOSIL RT 601 A | Wacker | 9/14/18 | SDS |
Mosheni | ELASTOSIL RT 601 B | Wacker | 9/14/18 | SDS |
nBn Technologies | AZ-P4110 Photoresist | AZ | 4/3/15 | SDS |
nBn Technologies | Citric Acid | Alfa Aesar | 9/3/13 | SDS |
nBn Technologies | Developer RD6 | Futurrex | 1/21/19 | |
nBn Technologies | Edge Bead Remover EBR2 | Futurrex | 4/30/15 | |
nBn Technologies | IC1-200 - Dielectric Coating | Futurrex | 1/31/18 | SDS |
nBn Technologies | NR1-6000PY Photoresist | Futurrex | 4/30/15 | SDS |
nBn Technologies | NR7-1000PY Photoresist | Futurrex | 4/30/15 | |
nBn Technologies | NR74G-1000P Photoresist | Futurrex | 1/21/16 | |
nBn Technologies | NR9g-1000PY Photoresist | Futurrex | 5/1/15 | SDS |
nBn Technologies | NR9g-1500PY Photoresist | Futurrex | 1/10/19 | SDS |
nBn Technologies | NR9-8000 Photoresist | Futurrex | 5/1/15 | SDS |
nBn Technologies | PR1-1000A1 Photoresist | Futurrex | 1/21/19 | SDS |
nBn Technologies | Remover RR41 | Futurrex | 1/21/19 | |
nBn Technologies | Remover RR5 | Futurrex | 1/29/14 | |
nBn Technologies | Spin on Glass - Zn | Desert Silicon | 3/28/18 | SDS |
nBn Technologies | Sodium Hypochlorite | Science Company | 4/15/15 | SDS |
nBn Technologies | Photopolymerization Accel - AN-910-E | Spectra Group Limited, | 2/23/15 | |
nBn Technologies | Visible/UV light Photoinitiator - H-Nu 470 | Spectra Group Limited, | 2/18/15 | |
nBn Technologies | Photoacid generator - H-Nu 254 | Spectra Group Limited, | 11/21/17 | |
nBn Technologies | Zinc Phosphorus Dopant ZPDC2-2000 | Futurrex | 1/23/18 | SDS |
Ninkov | Acetic Acid Glacial | Sigma Aldrich | 6/27/14 | SDS |
Olles | Ammonium Fluoride | Anachemica | 2/27/16 | SDS |
Olles | TEOS | Acros | 5/21/14 | SDS |
Olles | Bismuth(III) nitrate pentahydrate | Beantown Chemical | 11/24/14 | SDS |
Orthogonal | Orthogonal Developer 100 | Orthogonal | ||
Orthogonal | Orthogonal Developer 103 | Orthogonal | ||
Orthogonal | Orthogonal Developer 110 | Orthogonal | ||
Orthogonal | Orthogonal Stripper 310 | Orthogonal | ||
Orthogonal | Orthogonal Stripper 610 | Orthogonal | ||
Orthogonal | Orthogonal Stripper 700 | Orthogonal | ||
Orthogonal | Orthogonal Stripper 900 | Orthogonal | ||
Orthogonal | OSCoR 1510 Photoresist | Orthogonal | ||
Orthogonal | OSCoR 2312 Photoresist | Orthogonal | ||
Orthogonal | OSCoR 4000 Photoresist | Orthogonal | ||
Orthogonal | OSCoR CP Photoresist | Orthogonal | ||
Orthogonal | Orthogonal Solution 900 | Orthogonal | ||
Orthogonal | AZ 100 Remover | AZ | 4/13/15 | |
Orthogonal | AZ 300 MIF Developer | AZ | 9/19/12 | |
Orthogonal | AZ 1512 Photoresist | AZ | 10/16/13 | |
Orthogonal | AZ nLOF 2020 Photoresist | AZ | 4/17/15 | |
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PCB Piezotronics | Ti Tungsten Etch | Transene | 4/1/16 | SDS |
Preble | 495 PMMA Resist | Microchem | 10/10/14 | |
Preble | Espacer 300Z | Showa Denko | 3/1/09 | |
Preble | Fox Flowable Oxide | Dow Corning | 8/21/15 | SDS |
Preble | ma-N 1405 Photoresist | Micro Resist | 6/11/15 | SDS |
Preble | ma-N 2401 Photoresist | Micro Resist | 6/11/15 | SDS |
Preble | MIBK:IPA Developer 1:3 | Microchem | 9/8/2011 | |
Preble | SU8-2002 Photoresist | Microchem | 10/15/14 | SDS |
Preble | SU8 Developer | Microchem | 10/28/11 | SDS |
Preble | SurPass 3000 | DisChem | 4/15/14 | |
Preble | XR-1541-004 E-Beam Resist | Dow Corning | 8/19/15 | |
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Raisanen | Teflon AF | DuPont | 5/27/15 | |
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Rommel | 950 PMMA Resist | Microchem | 10/10/14 | |
Rommel | Adhesion Promoter AP 3000 | Dow | 2/22/11 | |
Rommel | Citric Acid | Alfa Aesar | 9/3/13 | SDS |
Rommel | Cyclotene 3022 | Dow | 5/4/15 | SDS |
Rommel | Hexid Heat Transfer Fluid | Edwards | 1/1/13 | |
Rommel | LOR 5A Photoresist | MicroChem | 10/17/14 | SDS |
Rommel | Mesitylene | Alfa Aesar | 1/23/15 | |
Rommel | XR-1541-004 E-Beam Resist | Dow | 4/27/15 | |
Sahin | SU8 2000 Thinner - Cyclopentone | MicroChem | 7/2/13 | SDS |
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Schertzer | Fluorinert FC40 | Sigma Aldrich | 11/12/14 | SDS |
Schertzer | Nafion D521 | Alfa Aesar | 3/18/13 | SDS |
Schertzer | PFC1600V | Cytonix | 5/16/17 | SDS |
Schertzer | PFC160 | Cytonix | 5/23/16 | SDS |
Schertzer | Polymer Microspheres | Bangs | 5/19/15 | SDS |
Schertzer | SU8-2001 Photoresist | Microchem | 10/15/14 | SDS |
Schertzer | SU8 3005 Photoresist | Microchem | 10/15/14 | SDS |
Schertzer | Teflon AF | Dupont | 5/27/15 | SDS |
SimPore | Boron Doped B Series SOG | Desert Silicon | 4/6/16 | SDS |
SimPore | ProTEK B3 25 | Brewer | 7/13/15 | SDS |
SimPore | ProTEK B3 Primer | Brewer | 4/21/15 | SDS |
SimPore | PSE-200 | Transene | 4/1/16 | |
SimPore | PSE-300S/F | Transene | 7/1/13 | |
SimPore | Microposit S1813 Photoresist | Dow | 10/28/11 | SDS |
SimPore | SU8 Developer | Microchem | 10/28/11 | SDS |
Triton | AZ MIR701 Photoresist | AZ | 9/4/15 | SDS |
Triton | AZ P4400 Photoresist | AZ | 12/31/14 | |
Triton | AZ 400 K 4:1 Developer | AZ | 9/5/14 | SDS |
Triton | LOR 7B | Microchem | 4/19/12 | SDS |
Triton | MF 321 Developer | Dow / Rohm & Haas | 4/26/15 | SDS |
Triton | TDMR-AR5300 | TOK | 8/1/14 | SDS |
UCSD | AZ P4620 Photoresist | AZ | 8/13/15 | SDS |
Wan | SU8 2015 Photoresist | Microchem | 10/15/14 | SDS |
Xerox | CT-2000 | Fuji | ||
Xerox | SB-4000 | Fuji | ||
Xerox | SG-4000 | Fuji | ||
Xerox | SR-4000 | Fuji | ||
Zhang | Silver Nitrate | Cascade Silver Company | 1/1/15 | SDS |
Zhang | Sodum Dodecyl Sulfate | Affymetrix | 4/21/15 | SDS |
Zhang | Styrene | TCI America | 8/18/15 | SDS |